Invention Grant
- Patent Title: Machine condition measurement system with haptic feedback
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Application No.: US14790407Application Date: 2015-07-02
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Publication No.: US10748406B2Publication Date: 2020-08-18
- Inventor: Johannes I. Boerhout
- Applicant: Aktiebolaget SKF
- Applicant Address: SE Gothenburg
- Assignee: Aktiebolaget SKF
- Current Assignee: Aktiebolaget SKF
- Current Assignee Address: SE Gothenburg
- Agency: Garcia-Zamor Intellectual Property Law
- Agent Ruy Garcia-Zamor; Bryan Peckjian
- Main IPC: G06F17/00
- IPC: G06F17/00 ; G08B21/18 ; G06F1/16 ; G06F3/01 ; G08B6/00

Abstract:
A machine condition monitoring system employing a haptic feedback device. The haptic feedback device can be employed to notify an operator of an acquisition of a machine parameter measurement. The haptic feedback device can be integrated into a control unit of a condition monitoring device and/or a remote condition monitoring status receiving device. The haptic feedback device containing notification apparatus can be worn by the operator, thus providing immediate notification without requiring the Operator's undivided attention. The notification apparatus can be worn on the operator's waist, wrist, upper arm, ankle, neck, etc. The notification apparatus can also be stored within a pocket of a garment worn by the operator.
Public/Granted literature
- US20170004697A1 MACHINE CONDITION MEASUREMENT SYSTEM WITH HAPTIC FEEDBACK Public/Granted day:2017-01-05
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