An imprint apparatus for forming a pattern of an imprint material on a substrate using a mold includes a plurality of alignment scopes and a control unit. The control unit controls aligning of a shot region of the substrate and the mold based on outputs from the plurality of alignment scopes. Each of the plurality of alignment scopes outputs information indicating a relative position of a first mark selected from a plurality of first marks in the shot region and a second mark selected from a plurality of second marks on the mold. The control unit controls aligning of the shot region and the mold based on information excluding incorrect information from a plurality of pieces of information output from the plurality of alignment scopes.