Invention Grant
- Patent Title: Method and system for optical metrology in patterned structures
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Application No.: US16398297Application Date: 2019-04-30
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Publication No.: US10761036B2Publication Date: 2020-09-01
- Inventor: Boris Levant , Yanir Hainick , Vladimir Machavariani , Roy Koret , Gilad Barak
- Applicant: NOVA MEASURING INSTRUMENTS LTD.
- Applicant Address: IL Rehovot
- Assignee: NOVA MEASURING INSTRUMENTS LTD.
- Current Assignee: NOVA MEASURING INSTRUMENTS LTD.
- Current Assignee Address: IL Rehovot
- Agency: Alphapatent Associates, Ltd
- Agent Daniel J. Swirsky
- Main IPC: G01N21/956
- IPC: G01N21/956 ; G01B11/02 ; G03F7/20 ; G01N21/95

Abstract:
Determining parameters of a patterned structure located on top of an underneath layered structure, where input data is provided which includes first measured data PMD being a function ƒ of spectral intensity Iλ and phase ϕ, PMD=ƒ(Iλ; ϕ), corresponding to a complex spectral response of the underneath layered structure, and second measured data Smeas indicative of specular reflection spectral response of a sample formed by the patterned structure and the underneath layered structure, and where a general function F is also provided describing a relation between a theoretical optical response Stheor of the sample and a modeled optical response Smodel of the patterned structure and the complex spectral response PMD of the underneath layered structure, such that Stheor=F(Smodel; PMD), where the general function is then utilized for comparing the second measured data Smeas and the theoretical optical response Stheor, and determining parameter(s) of interest of the top structure.
Public/Granted literature
- US20190317024A1 METHOD AND SYSTEM FOR OPTICAL METROLOGY IN PATTERNED STRUCTURES Public/Granted day:2019-10-17
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