Invention Grant
- Patent Title: Image sensor and method for manufacturing thereof
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Application No.: US15985351Application Date: 2018-05-21
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Publication No.: US10777592B2Publication Date: 2020-09-15
- Inventor: Yun-Wei Cheng , Chun-Hao Chou , Yin-Chieh Huang , Wan-Chen Huang , Zhe-Ju Liu , Kuo-Cheng Lee , Chi-Cherng Jeng
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Maschoff Brennan
- Main IPC: H01L27/146
- IPC: H01L27/146

Abstract:
An image sensor includes a substrate, a photosensitive unit, a first grid and a color filter. The photosensitive unit is located within the substrate. The first grid is located above the substrate, and the first grid has a first portion and a second portion above the first portion, wherein the second portion has a rounded top surface extending from a sidewall of the first portion of the first grid. The color filter is located above the photosensitive unit and in contact with the rounded top surface of the second portion of the first grid.
Public/Granted literature
- US20180277582A1 IMAGE SENSOR AND METHOD FOR MANUFACTURING THEREOF Public/Granted day:2018-09-27
Information query
IPC分类: