Invention Grant
- Patent Title: Plasma processing reactor with a magnetic electron-blocking filter external of the chamber and uniform field within the chamber
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Application No.: US14832280Application Date: 2015-08-21
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Publication No.: US10784085B2Publication Date: 2020-09-22
- Inventor: Kartik Ramaswamy , Kenneth S. Collins , Steven Lane , Yang Yang , Lawrence Wong
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: H05H1/12
- IPC: H05H1/12 ; H01J37/32
Abstract:
An external magnetic filter to trap electrons surrounds a reactor chamber and has multiple magnets arranged in a circle, the magnetic orientation of each individual magnet being rotated relative to the orientation of the adjacent individual magnet by a difference angle that is a function of the arc subtended by the individual magnet.
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