Invention Grant
- Patent Title: Rotatable electrostatic chuck having backside gas supply
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Application No.: US15839563Application Date: 2017-12-12
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Publication No.: US10784139B2Publication Date: 2020-09-22
- Inventor: Bharath Swaminathan , Wei Wang
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Agent Alan Taboada
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L21/687 ; H01L21/67

Abstract:
Embodiments of a substrate support pedestal and an electrostatic chuck incorporating same are disclosed herein. In some embodiments, a substrate support pedestal includes: a body having an upper surface and a lower surface opposite the upper surface; one or more chucking electrodes disposed within the body; a plurality of substrate support elements protruding from the upper surface to support a substrate; a hole disposed in the lower surface at a center of and partially through the body; a plurality of gas holes disposed in the upper surface proximate the center of the body, wherein the plurality of gas holes is disposed above and fluidly coupled to the hole; and a plurality of gas distribution grooves formed in the upper surface and fluidly coupled to the plurality of gas holes.
Public/Granted literature
- US20180174880A1 ROTATABLE ELECTROSTATIC CHUCK HAVING BACKSIDE GAS SUPPLY Public/Granted day:2018-06-21
Information query
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