A mask cleaning apparatus and method of using the same includes a preheating zone preheating a mask, a first ultraviolet cleaning zone irradiating the mask with a first ultraviolet laser beam at a first irradiation angle, a first cooling zone cooling the mask irradiated with the first ultraviolet laser beam, a second ultraviolet cleaning zone irradiating the mask with a second ultraviolet laser beam at a second irradiation angle, a second cooling zone cooling the mask irradiated with the second ultraviolet laser beam, an infrared cleaning zone irradiating the mask with an infrared laser beam at a third irradiation angle, and a peeling zone spraying air onto the mask irradiated with the infrared laser beam.