- Patent Title: Method of determining a value of a parameter of interest, method of cleaning a signal containing information about a parameter of interest, device manufacturing method
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Application No.: US16170786Application Date: 2018-10-25
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Publication No.: US10795269B2Publication Date: 2020-10-06
- Inventor: Zili Zhou , Gerbrand Van Der Zouw , Nitesh Pandey , Markus Gerardus Martinus Maria Van Kraaij , Martinus Hubertus Maria Van Weert , Anagnostis Tsiatmas , Sergey Tarabrin , Hilko Dirk Bos
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@2d955546 com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@a45de4a com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@370245da
- Main IPC: G01J4/00
- IPC: G01J4/00 ; G03F7/20

Abstract:
The disclosure relates to methods of determining a value of a parameter of interest of a patterning process, and of cleaning a signal containing information about the parameter of interest. In one arrangement, first and second detected representations of radiation are obtained. The radiation is provided by redirection of polarized incident radiation by a structure. The first and second detected representations are derived respectively from first and second polarization components of the redirected radiation. An asymmetry in the first detected representation comprises a contribution from the parameter of interest and a contribution from one or more other sources of asymmetry. An asymmetry in the second detected representation comprises a larger contribution from said one or more other sources of asymmetry relative to a contribution from the parameter of interest. A combination of the first and second detected representations is used to determine a value of the parameter of interest.
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