Invention Grant
- Patent Title: Autonomous placement to satisfy self-aligned double patterning constraints
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Application No.: US16103011Application Date: 2018-08-14
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Publication No.: US10796064B2Publication Date: 2020-10-06
- Inventor: Hua Xiang , Gustavo Enrique Tellez , Shyam Ramji , Gi-Joon Nam
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Amin, Turocy & Watson, LLP
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G06F30/398 ; G06F30/392

Abstract:
Techniques regarding functional placement of one or more logic gates in a periodic circuit row configuration are provided. For example, one or more embodiments described herein can comprise a system, which can comprise a memory that can store computer executable components. The system can comprise a processor, operably coupled to the memory, and that can execute the computer executable components stored in the memory. The computer executable components can comprise an optimization component, operatively coupled to the processor, that can determine functional placement of a logic gate in a self-aligned double patterning process that can form a periodic circuit row configuration.
Public/Granted literature
- US20200057836A1 AUTONOMOUS PLACEMENT TO SATISFY SELF-ALIGNED DOUBLE PATTERNING CONSTRAINTS Public/Granted day:2020-02-20
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