Invention Grant
- Patent Title: Semiconductor device and method of forming the same
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Application No.: US15688936Application Date: 2017-08-29
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Publication No.: US10796996B2Publication Date: 2020-10-06
- Inventor: Chi-Ming Lu , Jung-Chih Tsao , Yao-Hsiang Liang , Chih-Chang Huang , Han-Chieh Huang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McClure, Qualey & Rodack, LLP
- Main IPC: H01L23/532
- IPC: H01L23/532 ; H01L23/522 ; H01L21/768

Abstract:
A semiconductor device includes a substrate, a dielectric layer disposed on the substrate, and a conductive stack disposed within the dielectric layer. The conductive stack includes at least one first conductive layer, a second conductive layer disposed over the at least one first conductive layer, and a contact structure disposed between the at least one first conductive layer and the second conductive layer. The contact structure includes a contact via electrically connecting the at least one first conductive layer to the second conductive layer, and a glue layer conformal to sidewalls and a bottom surface of the contact via. The glue layer has isolated lattices and an amorphous region at which the isolated lattices are uniformly distributed.
Public/Granted literature
- US20180261547A1 SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME Public/Granted day:2018-09-13
Information query
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