- 专利标题: Method of producing Co—Ni-based alloy
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申请号: US14966817申请日: 2015-12-11
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公开(公告)号: US10808306B2公开(公告)日: 2020-10-20
- 发明人: Akihiko Chiba , Takuma Otomo , Yasunori Akasaka , Tomoo Kobayashi , Ryo Sugawara
- 申请人: Akihiko Chiba , Takuma Otomo , Yasunori Akasaka , Tomoo Kobayashi , Ryo Sugawara
- 申请人地址: JP Chiba JP Miyagi
- 专利权人: SEIKO INSTRUMENTS INC.,TOHOKU UNIVERSITY
- 当前专利权人: SEIKO INSTRUMENTS INC.,TOHOKU UNIVERSITY
- 当前专利权人地址: JP Chiba JP Miyagi
- 代理机构: Brinks Gilson & Lione
- 优先权: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@609a8339
- 主分类号: C22F1/10
- IPC分类号: C22F1/10 ; C22F1/16 ; C22C19/05 ; C22C19/07 ; C22C30/00 ; C22C1/02 ; C22C19/00 ; H01F1/147 ; C22C19/03 ; B22D7/00 ; C21D1/26
摘要:
Provided is a Co—Ni-based alloy in which a crystal is easily controlled, a method of controlling a crystal of a Co—Ni-based alloy, a method of producing a Co—Ni-based alloy, and a Co—Ni-based alloy having controlled crystallinity. The Co—Ni-based alloy includes Co, Ni, Cr, and Mo, in which the Co—Ni-based alloy has a crystal texture in which a Goss orientation is a main orientation. The Co—Ni-based alloy preferably has a composition including, in terms of mass ratio: 28 to 42% of Co, 10 to 27% of Cr, 3 to 12% of Mo, 15 to 40% of Ni, 0.1 to 1% of Ti, 1.5% or less of Mn, 0.1 to 26% of Fe, 0.1% or less of C, and an inevitable impurity; and at least one kind selected from the group consisting of 3% or less of Nb, 5% or less of W, 0.5% or less of Al, 0.1% or less of Zr, and 0.01% or less of B.
公开/授权文献
- US20160097115A1 Method of Producing Co-Ni-Based Alloy 公开/授权日:2016-04-07
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