Invention Grant
- Patent Title: Charged particle beam device
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Application No.: US16364898Application Date: 2019-03-26
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Publication No.: US10832890B2Publication Date: 2020-11-10
- Inventor: Masato Suzuki , Satoshi Tomimatsu , Makoto Sato , Tatsuya Asahata
- Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
- Current Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Holland & Hart LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@2efe9aca
- Main IPC: H01J37/305
- IPC: H01J37/305 ; H01J37/20

Abstract:
To automatically repeat an operation of isolating a sample piece, which is formed by processing a sample with an ion beam, and transferring the sample piece to a sample piece holder, a charged particle beam device includes a computer configured to perform control so that, without rotating a needle with which the sample piece is fixed to the sample piece holder, a deposition film deposited on the needle is irradiated with a charged particle beam from a charged particle beam irradiation optical system.
Public/Granted literature
- US20190304745A1 CHARGED PARTICLE BEAM DEVICE Public/Granted day:2019-10-03
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