发明授权
- 专利标题: Semiconductor integrated circuit device having a standard cell which includes a fin
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申请号: US16211919申请日: 2018-12-06
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公开(公告)号: US10833075B2公开(公告)日: 2020-11-10
- 发明人: Hiroyuki Shimbo
- 申请人: SOCIONEXT INC.
- 申请人地址: JP Kanagawa
- 专利权人: SOCIONEXT INC.
- 当前专利权人: SOCIONEXT INC.
- 当前专利权人地址: JP Kanagawa
- 代理机构: McDermott Will & Emery LLP
- 优先权: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@46f8314a
- 主分类号: H01L27/088
- IPC分类号: H01L27/088 ; H01L21/8234 ; H01L27/02 ; H01L27/118 ; H01L21/84 ; H01L27/12 ; H01L23/528
摘要:
Disclosed herein is a semiconductor integrated circuit device including a standard cell with a fin extending in a first direction. The fin and a gate line extending in a second direction perpendicular to the first direction and provided on the fin constitute an active transistor. The fin and a dummy gate line provided in parallel with the gate line constitute a dummy transistor. The active transistor shares a node as its source or drain with the dummy transistor.
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