Invention Grant
- Patent Title: Apparatus and methods for wafer rotation in carousel susceptor
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Application No.: US16285401Application Date: 2019-02-26
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Publication No.: US10861736B2Publication Date: 2020-12-08
- Inventor: Kaushal Gangakhedkar , Joseph Yudovsky
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L21/687
- IPC: H01L21/687 ; C23C16/455 ; C23C16/458
Abstract:
Apparatus and method for processing a plurality of substrates in a batch processing chamber are described. The apparatus comprises a susceptor assembly, a lift assembly and a rotation assembly. The susceptor assembly has a top surface and a bottom surface with a plurality of recesses in the top surface. Each of the recesses has a lift pocket in the recess bottom. The lift assembly including a lift plate having a top surface to contact the substrate. The lift plate is connected to a lift shaft that extends through the susceptor assembly and connects to a lift friction pad. The rotation assembly has a rotation friction pad that contacts the lift friction pad. The rotation friction pad is connected to a rotation shaft and can be vertically aligned with the lift friction pad.
Public/Granted literature
- US20190189498A1 Apparatus And Methods For Wafer Rotation In Carousel Susceptor Public/Granted day:2019-06-20
Information query
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