发明授权
- 专利标题: Electrically or temperature activated shape-memory materials for warpage control
-
申请号: US16036697申请日: 2018-07-16
-
公开(公告)号: US10861797B2公开(公告)日: 2020-12-08
- 发明人: Bret K. Street
- 申请人: Micron Technology, Inc.
- 申请人地址: US ID Boise
- 专利权人: MICRON TECHNOLOGY, INC.
- 当前专利权人: MICRON TECHNOLOGY, INC.
- 当前专利权人地址: US ID Boise
- 代理机构: Parsons Behle & Latimer
- 主分类号: H01L23/373
- IPC分类号: H01L23/373 ; H01L23/00 ; H01L21/326 ; H01L21/324 ; F03G7/06
摘要:
A semiconductor device assembly including a shape-memory element connected to at least one component of the semiconductor device assembly. The shape-memory element may be temperature activated or electrically activated. The shape-memory element is configured to move to reduce, minimize, or modify a warpage of a component of the assembly by moving to an initial shape. The shape-memory element may be applied to a surface of a component of the semiconductor device assembly or may be positioned within a component of the semiconductor device assembly such as a layer. The shape-memory element may be connected between two components of the semiconductor device assembly. A plurality of shape-memory elements may be used to reduce, minimize, and/or modify warpage of one or more components of a semiconductor device assembly.
公开/授权文献
信息查询
IPC分类: