- 专利标题: Method of aberration measurement and electron microscope
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申请号: US16282897申请日: 2019-02-22
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公开(公告)号: US10886099B2公开(公告)日: 2021-01-05
- 发明人: Yuji Kohno , Akiho Nakamura
- 申请人: JEOL Ltd.
- 申请人地址: JP Tokyo
- 专利权人: JEOL Ltd.
- 当前专利权人: JEOL Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: The Webb Law Firm
- 优先权: JP2018-030713 20180223
- 主分类号: H01J37/00
- IPC分类号: H01J37/00 ; H01J37/22 ; H01J37/28 ; H01J37/26 ; H01J37/153
摘要:
There is provided a method of aberration measurement capable of reducing the effects of image drift. The novel method of aberration measurement is for use in an electron microscope. The method comprises the steps of: acquiring a first image that is a TEM (transmission electron microscope) image of a sample; scanning the illumination angle of an electron beam impinging on the sample and acquiring a second image by multiple exposure of a plurality of TEM images generated at different illumination angles; and calculating aberrations from the first and second images.
公开/授权文献
- US20190267210A1 Method of Aberration Measurement and Electron Microscope 公开/授权日:2019-08-29
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