Invention Grant
- Patent Title: Double-channel HEMT device and manufacturing method thereof
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Application No.: US16431642Application Date: 2019-06-04
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Publication No.: US10892357B2Publication Date: 2021-01-12
- Inventor: Ferdinando Iucolano , Alessandro Chini
- Applicant: STMICROELECTRONICS S.R.L.
- Applicant Address: IT Agrate Brianza
- Assignee: STMICROELECTRONICS S.R.L.
- Current Assignee: STMICROELECTRONICS S.R.L.
- Current Assignee Address: IT Agrate Brianza
- Agency: Seed IP Law Group LLP
- Priority: EP16425047 20160530
- Main IPC: H01L29/778
- IPC: H01L29/778 ; H01L29/66 ; H01L29/06 ; H01L21/02 ; H01L29/20 ; H01L29/205 ; H01L29/40 ; H01L29/417 ; H01L29/423

Abstract:
An HEMT device, comprising: a semiconductor body including a heterojunction structure; a dielectric layer on the semiconductor body; a gate electrode; a drain electrode, facing a first side of the gate electrode; and a source electrode, facing a second side opposite to the first side of the gate electrode; an auxiliary channel layer, which extends over the heterojunction structure between the gate electrode and the drain electrode, in electrical contact with the drain electrode and at a distance from the gate electrode, and forming an additional conductive path for charge carriers that flow between the source electrode and the drain electrode.
Public/Granted literature
- US20190288100A1 DOUBLE-CHANNEL HEMT DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2019-09-19
Information query
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