- 专利标题: Systems and methods for exposure control
-
申请号: US16395615申请日: 2019-04-26
-
公开(公告)号: US10924684B2公开(公告)日: 2021-02-16
- 发明人: Erping Qu , Qianfeng Huang , Runfa Pan , Liangcheng Li
- 申请人: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.
- 申请人地址: CN Zhejiang
- 专利权人: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.
- 当前专利权人: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.
- 当前专利权人地址: CN Zhejiang
- 代理机构: Metis IP LLC
- 优先权: CN201610957318 20161026,CN201611229065 20161227
- 主分类号: H04N5/235
- IPC分类号: H04N5/235 ; H04N5/243 ; H04N5/238 ; H04N5/232
摘要:
The present disclosure relates to systems and methods for determining the exposure setting of an imaging device having a set of exposure parameters. A target luma of the imaging device may be determined. A correspondence table may be obtained. The correspondence table may relate to a plurality of reference luma values and a plurality of groups of operation values of the set of exposure parameters, a group of operation values corresponding to a reference luma value. A reference luma value and a group of operation values of the set of exposure parameters may be identified based on the target luma and the correspondence table. An adjustment of at least one exposure parameter of the imaging device may be determined based on the identified group of operation values. The at least one exposure parameter of the imaging device may be adjusted based on the determined adjustment.
公开/授权文献
- US20190253601A1 SYSTEMS AND METHODS FOR EXPOSURE CONTROL 公开/授权日:2019-08-15
信息查询