Invention Grant
- Patent Title: Cover plate processing method, control apparatus, processing apparatus, and storage medium
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Application No.: US16057270Application Date: 2018-08-07
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Publication No.: US10942296B2Publication Date: 2021-03-09
- Inventor: Yong Yang
- Applicant: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Hubei
- Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Hubei
- Priority: CN201810289813.5 20180330
- Main IPC: G02B1/12
- IPC: G02B1/12 ; G02B1/18 ; C03C15/00 ; G02B1/11 ; G02B27/48 ; G06F17/18 ; G02B5/02 ; G02B27/00 ; G02F1/1333 ; G06F17/14

Abstract:
The present invention provides a processing method of a cover plate, a control apparatus, a cover plate processing apparatus, and a storage medium. The processing method utilizes a scanning device to scan surfaces and obtain surface features of a first cover plate and a second cover plate, and performs Fourier transformation on the surface features of the first cover plate and the second cover plate to obtain the surface feature frequency variation distribution curves of the first cover plate and the second cover plate, thereby to obtain the surface feature frequency variation distribution curves of a high-resolution cover plate. Fourier inverse transformation is performed on the surface feature frequency variation distribution curves of the high-resolution cover plate to obtain surface features of a target cover plate, so that the high-resolution cover plate so processed meets balancing speckles and anti-glare requirements.
Public/Granted literature
- US20190302315A1 COVER PLATE PROCESSING METHOD, CONTROL APPARATUS, PROCESSING APPARATUS, AND STORAGE MEDIUM Public/Granted day:2019-10-03
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