Invention Grant
- Patent Title: Structure and method of manufacturing structure
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Application No.: US16553134Application Date: 2019-08-27
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Publication No.: US10942438B2Publication Date: 2021-03-09
- Inventor: Shunya Katoh , Rie Takasago
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: JCIPRNET
- Priority: JPJP2017-039413 20170302
- Main IPC: G03B21/604
- IPC: G03B21/604 ; B32B7/023 ; G02B5/26 ; G02B5/30 ; G02F1/1335

Abstract:
An object of the present invention is to provide a structure having an excellent diffuse reflectivity and a method of manufacturing a structure. The object is achieved by a structure including a plurality of reflection layers formed by fixing a cholesteric liquid crystalline phase, the reflection layers being laminated, in which in a reflection layer, a bright portion and a dark portion derived from the cholesteric liquid crystalline phase have wavy structures in a cross section, and undulations of the wavy structures of bright portions closest to each other coincide in the adjacent reflection layers; and by a method of manufacturing a structure including forming a reflection layer formed by fixing a cholesteric liquid crystalline phase, in which a bright portion and a dark portion have wavy structures, in a cross section, and forming the reflection layer on a first reflection layer by a coating method using an composition containing a liquid crystal compound and a chiral agent.
Public/Granted literature
- US20190391479A1 STRUCTURE AND METHOD OF MANUFACTURING STRUCTURE Public/Granted day:2019-12-26
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