Invention Grant
- Patent Title: Semiconductor device and method of manufacturing the same
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Application No.: US16460468Application Date: 2019-07-02
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Publication No.: US10943782B2Publication Date: 2021-03-09
- Inventor: Hui-jung Kim , Kiseok Lee , Keunnam Kim , Yoosang Hwang
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2018-0083001 20180717
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L27/24 ; H01L27/108 ; H01L27/22 ; H01L21/306

Abstract:
Disclosed are semiconductor devices and methods of manufacturing the same. The method comprises alternately stacking a plurality of dielectric layers and a plurality of first semiconductor layers to form a mold structure on a substrate, forming a hole penetrating the mold structure, forming on the substrate a second semiconductor layer filling the hole, and irradiating a laser onto the second semiconductor layer.
Public/Granted literature
- US20200027734A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2020-01-23
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