Invention Grant
- Patent Title: Applying first and second weaving masks
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Application No.: US16301716Application Date: 2016-07-29
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Publication No.: US10946659B2Publication Date: 2021-03-16
- Inventor: Leticia Rubio , Utpal Sarkar , Xavier Quintero Ruiz
- Applicant: Hewlett-Packard Development Company, L.P.
- Applicant Address: US TX Houston
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Houston
- Agency: HP Inc. Patent Department
- International Application: PCT/US2016/044642 WO 20160729
- International Announcement: WO2018/022078 WO 20180201
- Main IPC: B41J2/155
- IPC: B41J2/155 ; B41J2/21 ; B41J2/14 ; G06K15/10

Abstract:
A printing apparatus comprises a printhead and a controller. The printhead includes dies, each die comprising rows of nozzles, wherein, in an overlapping region, the rows of nozzles of two dies overlap in a first direction, in which a relative movement between the printhead and a print medium takes place during operation of the printing apparatus. The controller is to apply a first weaving mask to a first row of nozzles of a first die and a second weaving mask to a second row of nozzles of the first die, the second weaving mask being different from the first weaving mask, the weaving masks defining, independent of print data, which of the nozzles of the corresponding row are to be used for printing in the overlapping region.
Public/Granted literature
- US20190291435A1 APPLYING FIRST AND SECOND WEAVING MASKS Public/Granted day:2019-09-26
Information query
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