Invention Grant
- Patent Title: Lithographic method and apparatus
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Application No.: US16500933Application Date: 2018-03-06
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Publication No.: US10948832B2Publication Date: 2021-03-16
- Inventor: Nick Kant , Robertus Martinus Alphonsus Van Herpen , Mark Louwrens Beks , Lense Hendrik-Jan Maria Swaenen , Nico Vanroose , James Robert Downes
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne. Kessler. Goldstein & Fox P.L.L.C.
- Priority: EP17165195 20170406
- International Application: PCT/EP2018/055446 WO 20180306
- International Announcement: WO2018/184783 WO 20181011
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A method of reducing an aberration arising during operation of a lithographic apparatus, the method comprising measuring the aberration to obtain an aberration signal, the aberration signal comprising a first component and a second component, wherein the first component of the aberration signal comprises a first frequency band and the second component of the aberration signal comprises a second frequency band, wherein the first frequency band comprises frequencies that are higher than frequencies comprised in the second frequency band, calculating a correction, wherein a first part of the correction is calculated based on the first component of the aberration signal, and applying the correction to the lithographic apparatus.
Information query
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