- 专利标题： Fine mask support frame, fine mask, and method for fabricating the same
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申请号： US16301650申请日： 2018-01-05
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公开(公告)号： US10961616B2公开(公告)日： 2021-03-30
- 发明人: Zhiming Lin , Baojun Li , Jian Zhang , Pu Sun , Chun Chieh Huang
- 申请人： BOE TECHNOLOGY GROUP CO., LTD. , ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- 申请人地址： CN Beijing; CN Inner Mongolia
- 专利权人： BOE TECHNOLOGY GROUP CO., LTD.,ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- 当前专利权人： BOE TECHNOLOGY GROUP CO., LTD.,ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- 当前专利权人地址： CN Beijing; CN Inner Mongolia
- 代理机构： Arent Fox LLP
- 代理商 Michael Fainberg
- 优先权： CN201710333242.6 20170512
- 国际申请： PCT/CN2018/071600 WO 20180105
- 国际公布： WO2018/205664 WO 20181115
- 主分类号： C23C14/04
- IPC分类号： C23C14/04 ; H01L51/56 ; C23C14/24 ; H01L51/00
摘要：
This disclosure relates to the field of display fabrication technologies, and discloses a fine mask support frame, a fine mask, and a method for fabricating the same. The fine mask support frame includes: a plurality of bezels surrounding a mask area, wherein adjustment openings are arranged on at least one pair of bezels arranged opposite to each other, and at least one adjustment piece is arranged on each of the adjustment openings, wherein the adjustment piece is configured to adjust a shape of a corresponding adjustment opening to thereby adjust deformation of the mask area.
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