Invention Grant
- Patent Title: Self-aligned base and emitter for a bipolar junction transistor
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Application No.: US16551061Application Date: 2019-08-26
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Publication No.: US10971597B2Publication Date: 2021-04-06
- Inventor: Qizhi Liu , Vibhor Jain , John J. Pekarik
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Thompson Hine LLP
- Agent Anthony Canale
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/06 ; H01L29/08 ; H01L29/10 ; H01L21/02 ; H01L29/165 ; H01L29/737

Abstract:
Device structures and fabrication methods for a bipolar junction transistor. A trench isolation region surrounds an active region that includes a collector. A base layer includes a first section and a second section that are located over the active region. An emitter is positioned on the first section of the base layer, and an extrinsic base layer is positioned on the second section of the base layer. The extrinsic base layer has a side surface adjacent to the emitter. The side surface of the extrinsic base layer is inclined relative to a top surface of the base layer in a direction away from the emitter.
Public/Granted literature
- US20210066474A1 SELF-ALIGNED BASE AND EMITTER FOR A BIPOLAR JUNCTION TRANSISTOR Public/Granted day:2021-03-04
Information query
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