- 专利标题： Correlation between conductivity and pH measurements for KOH texturing solutions and additives
-
申请号： US16237302申请日： 2018-12-31
-
公开(公告)号： US10991589B2公开(公告)日： 2021-04-27
- 发明人: Ismail Kashkoush , Jennifer Rieker , Gim-Syang Chen , Dennis Nemeth
- 申请人： NAURA Akrion, Inc.
- 申请人地址： US PA Allentown
- 专利权人： NAURA Akrion, Inc.
- 当前专利权人： NAURA Akrion, Inc.
- 当前专利权人地址： US PA Allentown
- 代理机构： The Belles Group, P.C.
- 主分类号： H01L21/306
- IPC分类号： H01L21/306 ; H01L21/66 ; H01L21/67 ; H01L31/0236
摘要：
The variability of an etchant concentration in an immersion processes for treatment of semiconductor devices can be significantly lowered by continuously measuring the conductivity of an etchant solution and comparing against predetermined thresholds. The etchant concentration can be maintained by a feed and bleed process based on conductivity measurements of the etchant solution and the conductivity measurements being correlated with premeasured pH values of an etchant solution.
公开/授权文献
信息查询
IPC分类:
