- 专利标题: Semiconductor device and method
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申请号: US16207974申请日: 2018-12-03
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公开(公告)号: US10992100B2公开(公告)日: 2021-04-27
- 发明人: Chen-Hua Yu , An-Jhih Su , Chia-Nan Yuan , Shih-Guo Shen , Der-Chyang Yeh , Yu-Hung Lin , Ming Shih Yeh
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Slater Matsil, LLP
- 主分类号: H01S5/02
- IPC分类号: H01S5/02 ; H01S5/042 ; H01S5/022 ; H01S5/183 ; H01S5/30 ; H01S5/026 ; H01S5/323 ; H01S5/0234 ; H01S5/0237 ; H01S5/02234
摘要:
In an embodiment, a device includes: a first reflective structure including first doped layers of a semiconductive material, alternating ones of the first doped layers being doped with a p-type dopant; a second reflective structure including second doped layers of the semiconductive material, alternating ones of the second doped layers being doped with a n-type dopant; an emitting semiconductor region disposed between the first reflective structure and the second reflective structure; a contact pad on the second reflective structure, a work function of the contact pad being less than a work function of the second reflective structure; a bonding layer on the contact pad, a work function of the bonding layer being greater than the work function of the second reflective structure; and a conductive connector on the bonding layer.
公开/授权文献
- US20200014169A1 Semiconductor Device and Method 公开/授权日:2020-01-09
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