- 专利标题: Surface finishes for high density interconnect architectures
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申请号: US16561974申请日: 2019-09-05
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公开(公告)号: US10998282B2公开(公告)日: 2021-05-04
- 发明人: David Unruh , Srinivas V. Pietambaram
- 申请人: Intel Corporation
- 申请人地址: US CA Santa Clara
- 专利权人: Intel Corporation
- 当前专利权人: Intel Corporation
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Schwegman Lundberg & Woessner, P.A.
- 主分类号: H01L23/00
- IPC分类号: H01L23/00
摘要:
An electroless nickel, electroless palladium, electroless tin stack and associated methods are shown. An example method to form a solder bump may include forming a layer of a second material over a first material at a base of a trench in a solder resist layer. The first material includes nickel and the second material includes palladium. The method further includes depositing a third material that includes tin on the second material using an electroless deposition process, and forming a solder bump out of the third material using a reflow and deflux process.
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