Invention Grant
- Patent Title: Charged particle beam device
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Application No.: US16786482Application Date: 2020-02-10
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Publication No.: US11011345B2Publication Date: 2021-05-18
- Inventor: Takumi Hatakeyama , Naoya Ishigaki
- Applicant: Hitachi High-Tech Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Tech Corporation
- Current Assignee: Hitachi High-Tech Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JPJP2019-043299 20190311
- Main IPC: H01J37/18
- IPC: H01J37/18 ; H01J37/28 ; H01J37/08 ; H01J37/244

Abstract:
The present disclosure relates to a charged particle beam device intended to appropriately measure the amount of foreign substances in a vacuum chamber. As one aspect for achieving the above object, proposed is a charged particle beam device including a charged particle beam column (9) configured to irradiate a sample with a charged particle beam, vacuum chambers (1, 2) configured to create a vacuum around the sample, a plurality of electrodes (12) arranged in the vacuum chambers, and a capacitance measuring device (13) for measuring the capacitance between the plurality of electrodes.
Public/Granted literature
- US20200294758A1 Charged Particle Beam Device Public/Granted day:2020-09-17
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