Invention Grant
- Patent Title: Method, substrate and apparatus to measure performance of optical metrology
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Application No.: US16610798Application Date: 2018-04-17
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Publication No.: US11016396B2Publication Date: 2021-05-25
- Inventor: Leonardo Gabriel Montilla , Krishanu Shome
- Applicant: ASML Holding N.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Holding N.V.
- Current Assignee: ASML Holding N.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2018/059699 WO 20180417
- International Announcement: WO2018/202414 WO 20181108
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A method including illuminating a product test substrate with radiation from a component, wherein the product test substrate does not have a device pattern etched therein and yields a non-zero sensitivity when illuminated, the non-zero sensitivity representing a change in an optical response characteristic of the product test substrate with respect to a change in a characteristic of the radiation; measuring at least a part of the radiation redirected by the product test substrate to determine a parameter value; and taking an action with respect to the component based on the parameter value.
Public/Granted literature
- US20200073255A1 Method, Substrate and Apparatus to Measure Performance of Optical Metrology Public/Granted day:2020-03-05
Information query
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