- 专利标题： Method of measuring a focus parameter relating to a structure formed using a lithographic process
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申请号： US16693453申请日： 2019-11-25
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公开(公告)号： US11022899B2公开(公告)日： 2021-06-01
- 发明人: Fahong Li , Sergei Sokolov
- 申请人： ASML Netherlands B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 优先权： EP18208291 20181126
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G01B11/27
摘要：
Disclosed is a method of measuring a focus parameter relating to formation of a structure using a lithographic process, and associated metrology device. The method comprises obtaining measurement data relating to a cross-polarized measurement of said structure; and determining a value for said focus parameter based on the measurement data.
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