Invention Grant
- Patent Title: Photoresist and manufacturing method of photoresist patterns
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Application No.: US16424734Application Date: 2019-05-29
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Publication No.: US11036141B2Publication Date: 2021-06-15
- Inventor: Ming Liu , Yueping Zuo , Qiuhua Meng , Chunyang Wang , Fei Fang
- Applicant: BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Beijing
- Agency: Collard & Roe, P.C.
- Priority: CN201811351459.0 20181114
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/20
Abstract:
A photoresist and a method of manufacturing photoresist patterns are disclosed. The photoresist includes a plurality of photosensitive units, and each photosensitive unit has magnetism.
Public/Granted literature
- US20200150536A1 PHOTORESIST AND MANUFACTURING METHOD OF PHOTORESIST PATTERNS Public/Granted day:2020-05-14
Information query
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