Invention Grant
- Patent Title: Extreme ultraviolet light generation apparatus and maintenance method
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Application No.: US16731561Application Date: 2019-12-31
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Publication No.: US11036150B2Publication Date: 2021-06-15
- Inventor: Katsuhiko Wakana
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H05G2/00

Abstract:
An extreme ultraviolet light generation apparatus includes: an optical base; and a chamber module replaceable from the optical base. The chamber module includes a chamber in which extreme ultraviolet light is generated, a condenser mirror disposed inside the chamber and configured to condense extreme ultraviolet light generated inside the chamber, a window configured to transmit, into the chamber, a laser beam introduced into the optical base, and having a function to seal up the chamber, and a laser beam condensation optical system configured to condense the laser beam having transmitted through the window.
Information query
IPC分类: