Invention Grant
- Patent Title: Aperture array and production method therefor
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Application No.: US15480808Application Date: 2017-04-06
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Publication No.: US11041787B2Publication Date: 2021-06-22
- Inventor: Naoki Kawara , Masaru Banju , Takashi Kondo , Seiji Kamba
- Applicant: Murata Manufacturing Co., Ltd.
- Applicant Address: JP Nagaokakyo
- Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee Address: JP Nagaokakyo
- Agency: Arent Fox LLP
- Priority: JPJP2015-009996 20150122
- Main IPC: G01N1/40
- IPC: G01N1/40 ; G01N21/3581 ; B01D29/00 ; B01D29/56

Abstract:
A film-shaped aperture array includes a first principal surface and a second principal surface opposed to each other and a plurality of apertures penetrating the first principal surface and the second principal surface. A projection projecting from the second principal surface in a normal direction of the second principal surface is provided in at least one region in contact with three or more of the plurality of apertures in a part of the second principal surface, when viewed in plan from the normal direction of the second principal surface.
Public/Granted literature
- US20170212022A1 APERTURE ARRAY AND PRODUCTION METHOD THEREFOR Public/Granted day:2017-07-27
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