Invention Grant
- Patent Title: Integrated circuit devices including vertical field-effect transistors (VFETs)
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Application No.: US16434245Application Date: 2019-06-07
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Publication No.: US11056489B2Publication Date: 2021-07-06
- Inventor: Jung Ho Do
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Myers Bigel, P.A.
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L27/092 ; H01L23/522 ; H01L27/02

Abstract:
Integrated circuit devices including standard cells are provided. The standard cells may include a first vertical field effect transistor (VFET) having a first conductivity type, and a second VFET having a second conductivity type. The first VFET may include a first top source/drain region, a first channel region, and a first bottom source/drain region. The second VFET may include a second top source/drain region, a second channel region, and a second bottom source/drain region. The standard cells may also include a conductive line that is electrically connected to the first top source/drain region or the first bottom source/drain region and is electrically connected to the second bottom source/drain region. The standard cell may be configured to output an output signal thereof through the conductive line.
Information query
IPC分类: