Invention Grant
- Patent Title: Method and apparatus for thin wafer carrier
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Application No.: US16198569Application Date: 2018-11-21
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Publication No.: US11094573B2Publication Date: 2021-08-17
- Inventor: Jingyu Qiao , Qiwei Liang , Viachslav Babayan , Seshadri Ramaswami , Srinivas D. Nemani
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- Main IPC: H01L21/683
- IPC: H01L21/683 ; C23C16/56 ; C23C16/40

Abstract:
Disclosed herein is an electrostatic chuck (ESC) carrier. The ESC carrier may comprise a carrier substrate having a first surface and a second surface opposite the first surface. A first through substrate opening and a second through substrate opening may pass through the carrier substrate from the first surface to the second surface. A first conductor is in the first through substrate opening, and a second conductor is in the second through substrate opening. The ESC carrier may further comprise a first electrode over the first surface of the carrier substrate and electrically coupled to the first conductor, and a second electrode over the first surface of the carrier substrate and electrically coupled to the second conductor. An oxide layer may be formed over the first electrode and the second electrode.
Public/Granted literature
- US20200161156A1 METHOD AND APPARATUS FOR THIN WAFER CARRIER Public/Granted day:2020-05-21
Information query
IPC分类: