Invention Grant
- Patent Title: Vapor deposition apparatus, deposition method, and method of manufacturing organic light-emitting display apparatus by using the same
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Application No.: US15076488Application Date: 2016-03-21
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Publication No.: US11101328B2Publication Date: 2021-08-24
- Inventor: Suk-Won Jung , Myung-Soo Huh , Choel-Min Jang
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin
- Agency: Lewis Roca Rothgerber Christie LLP
- Priority: KR2010-2013-0016977 20130218
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C16/50 ; H05H1/24 ; C23C16/509 ; C23C16/54 ; H01L27/32 ; C23C16/44 ; C23C16/452 ; C23C16/455 ; H01L51/56

Abstract:
Provided is a vapor deposition apparatus including: a plasma generator configured to change at least a portion of a first raw material gas into a radical form; a corresponding surface corresponding to the plasma generator; a reaction space between the plasma generator and the corresponding surface; and an insulating member separated from, and surrounding the plasma generator.
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