Invention Grant
- Patent Title: Evaporation mask and evaporation method
-
Application No.: US16066222Application Date: 2017-06-27
-
Publication No.: US11104984B2Publication Date: 2021-08-31
- Inventor: Fan Yang , Yinan Liang , Kun Guo
- Applicant: BOE TECHNOLOGY GROUP CO., LTD , ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Applicant Address: CN Beijing; CN Inner Mongolia
- Assignee: BOE TECHNOLOGY GROUP CO., LTD,ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD,ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Current Assignee Address: CN Beijing; CN Inner Mongolia
- Priority: CN201611075496.4 20161130
- International Application: PCT/CN2017/090231 WO 20170627
- International Announcement: WO2018/099055 WO 20180607
- Main IPC: C23C14/04
- IPC: C23C14/04 ; C23C14/24 ; H01L51/00 ; H01L51/56 ; H01L51/50 ; H01L51/52

Abstract:
An evaporation mask and an evaporation method are disclosed. The evaporation mask includes a blocking region and a plurality of evaporation regions arranged in an array. Each of the plurality of evaporation regions is integrally formed as an opened structure; the blocking region is disposed to surround each of the evaporation regions to separate adjacent evaporation regions; and the blocking region is provided with a plurality of perforated structure.
Public/Granted literature
- US20200270741A1 EVAPORATION MASK AND EVAPORATION METHOD Public/Granted day:2020-08-27
Information query
IPC分类: