- 专利标题: Method of determining a characteristic of a structure, and metrology apparatus
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申请号: US16376639申请日: 2019-04-05
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公开(公告)号: US11119415B2公开(公告)日: 2021-09-14
- 发明人: Johannes Fitzgerald De Boer , Vasco Tomas Tenner , Arie Jeffrey Den Boef , Christos Messinis
- 申请人: ASML Netherlands B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 优先权: EP18166312 20180409
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G01N21/88
摘要:
Methods and apparatus are disclosed for determining a characteristic of a structure. In one arrangement, the structure is illuminated with first illumination radiation to generate first scattered radiation. A first interference pattern is formed by interference between a portion of the first scattered radiation reaching a sensor and first reference radiation. The structure is also illuminated with second illumination radiation from a different direction. A second interference pattern is formed using second reference radiation. The first and second interference patterns are used to determine the characteristic of the structure. Azimuthal angles of the first and second reference radiations onto the sensor are different.
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