Invention Grant
- Patent Title: Method of determining a characteristic of a structure, and metrology apparatus
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Application No.: US16376639Application Date: 2019-04-05
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Publication No.: US11119415B2Publication Date: 2021-09-14
- Inventor: Johannes Fitzgerald De Boer , Vasco Tomas Tenner , Arie Jeffrey Den Boef , Christos Messinis
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP18166312 20180409
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01N21/88

Abstract:
Methods and apparatus are disclosed for determining a characteristic of a structure. In one arrangement, the structure is illuminated with first illumination radiation to generate first scattered radiation. A first interference pattern is formed by interference between a portion of the first scattered radiation reaching a sensor and first reference radiation. The structure is also illuminated with second illumination radiation from a different direction. A second interference pattern is formed using second reference radiation. The first and second interference patterns are used to determine the characteristic of the structure. Azimuthal angles of the first and second reference radiations onto the sensor are different.
Public/Granted literature
- US20190310559A1 Method of Determining a Characteristic of a Structure, and Metrology Apparatus Public/Granted day:2019-10-10
Information query
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