- Patent Title: Method and apparatus to determine a patterning process parameter
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Application No.: US16790809Application Date: 2020-02-14
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Publication No.: US11145557B2Publication Date: 2021-10-12
- Inventor: Adriaan Johan Van Leest , Anagnostis Tsiatmas , Paul Christiaan Hinnen , Elliott Gerard McNamara , Alok Verma , Thomas Theeuwes , Hugo Augustinus Joseph Cramer
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G06F30/392
- IPC: G06F30/392 ; H01L21/66 ; G03F7/20 ; G03F9/00 ; G01N21/95

Abstract:
A method of configuring a parameter determination process, the method including: obtaining a mathematical model of a structure, the mathematical model configured to predict an optical response when illuminating the structure with a radiation beam and the structure having geometric symmetry at a nominal physical configuration; using, by a hardware computer system, the mathematical model to simulate a perturbation in the physical configuration of the structure of a certain amount to determine a corresponding change of the optical response in each of a plurality of pixels to obtain a plurality of pixel sensitivities; and based on the pixel sensitivities, determining a plurality of weights for combination with measured pixel optical characteristic values of the structure on a substrate to yield a value of a parameter associated with change in the physical configuration, each weight corresponding to a pixel.
Public/Granted literature
- US20200185281A1 METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER Public/Granted day:2020-06-11
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