发明授权
- 专利标题: Three-dimensional semiconductor memory device and method of manufacturing the same
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申请号: US16511698申请日: 2019-07-15
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公开(公告)号: US11145671B2公开(公告)日: 2021-10-12
- 发明人: Haejoon Lee , Sung-Soo Ahn , Ha-Na Kim
- 申请人: SAMSUNG ELECTRONICS CO., LTD.
- 申请人地址: KR Suwon-si
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址: KR Suwon-si
- 代理机构: Sughrue Mion, PLLC
- 优先权: KR10-2019-0005288 20190115
- 主分类号: H01L27/11582
- IPC分类号: H01L27/11582 ; H01L27/11556 ; H01L27/11526 ; H01L23/522 ; H01L27/11573 ; G11C16/04 ; G11C16/08 ; G11C16/24
摘要:
A three-dimensional semiconductor memory device is provided. The memory device includes a substrate with a cell array region and a connection region adjacent to the cell array region, the connection region including a first pad region and a second pad region; an electrode structure including electrodes stacked on the substrate, the electrode structure including an upper portion forming an upper staircase structure; a first dummy structure laterally spaced apart from the upper portion of the electrode structure and provided on the first pad region; and a second dummy structure laterally spaced apart from the upper portion of the electrode structure and provided on the second pad region. Each of the first dummy structure and the second dummy structure includes a dummy staircase structure, and the first dummy structure is located at higher level than the second dummy structure.
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