Invention Grant
- Patent Title: Method of measuring a parameter of a patterning process, metrology apparatus, target
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Application No.: US16708509Application Date: 2019-12-10
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Publication No.: US11150563B2Publication Date: 2021-10-19
- Inventor: Sergei Sokolov , Sergey Tarabrin , Su-Ting Cheng , Armand Eugene Albert Koolen , Markus Franciscus Antonius Eurlings , Koenraad Remi André Maria Schreel
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP18213270 20181218,EP19162436 20190313
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A technique of measuring a parameter of a patterning process is disclosed. In one arrangement, a target, formed by the patterning process, is illuminated. A sub-order diffraction component of radiation scattered from the target is detected and used to determine the parameter of the patterning process.
Information query
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