Invention Grant
- Patent Title: Semiconductor device for selectively performing isolation function and layout displacement method thereof
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Application No.: US16566002Application Date: 2019-09-10
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Publication No.: US11152058B2Publication Date: 2021-10-19
- Inventor: Sang-Yeop Baeck , Tae-Hyung Kim , Daeyoung Moon , Dong-Wook Seo , Inhak Lee , Hyunsu Choi , Taejoong Song , Jae-Seung Choi , Jung-Myung Kang , Hoon Kim , Jisu Yu , Sun-Yung Jang
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2016-0058860 20160513
- Main IPC: G11C11/419
- IPC: G11C11/419 ; G11C7/08 ; H01L23/528 ; H01L27/092 ; H01L27/11

Abstract:
A semiconductor device includes an active area extending in a first direction, a first transistor including a first gate electrode and first source and drain areas disposed on the active area, the first source and drain areas being disposed at opposite sides of the first gate electrode, a second transistor including a second gate electrode and second source and drain areas disposed on the active area, the second source and drain areas being disposed at opposite sides of the second gate electrode, and a third transistor including a third gate electrode and third source and drain areas disposed on the active area, the third source and drain areas being disposed at opposite sides of the third gate electrode, and the first gate electrode, the second gate electrode, and the third gate electrode extending in a second direction different from the first direction. The second transistor is configured to turn on and off, based on an operation mode of the semiconductor device.
Public/Granted literature
- US11183233B2 Semiconductor device for selectively performing isolation function and layout displacement method thereof Public/Granted day:2021-11-23
Information query
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