Invention Grant
- Patent Title: Memory device and manufacturing method thereof
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Application No.: US16573615Application Date: 2019-09-17
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Publication No.: US11152565B2Publication Date: 2021-10-19
- Inventor: Yu-Sheng Chen , Da-Ching Chiou , Jau-Yi Wu , Carlos H. Diaz
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Maschoff Brennan
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H01L27/24

Abstract:
A memory device includes a conductive wire, a first 2-D material layer, a phase change element, and a top electrode. The first 2-D material layer is over the conductive wire. The phase change element extends along a surface of the first 2-D material layer distal to the conductive layer. The top electrode is over the phase change element.
Public/Granted literature
- US20210083181A1 MEMORY DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2021-03-18
Information query
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