Invention Grant
- Patent Title: Image sensor and method of forming the same
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Application No.: US16512834Application Date: 2019-07-16
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Publication No.: US11171172B2Publication Date: 2021-11-09
- Inventor: Yun-Wei Cheng , Chun-Hao Chou , Kuo-Cheng Lee , Ying-Hao Chen
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McClure, Qualey & Rodack, LLP
- Main IPC: H01L27/146
- IPC: H01L27/146

Abstract:
A back side illumination (BSI) image sensor is provided. The BSI image sensor includes a semiconductor substrate, a first dielectric layer, a reflective element, a second dielectric layer and a color filter layer. The semiconductor substrate has a front side and a back side. The first dielectric layer is disposed on the front side of the semiconductor substrate. The reflective element is disposed on the first dielectric layer, in which the reflective element has an inner sidewall contacting the first dielectric layer, and the inner sidewall has a zigzag profile. The second dielectric layer is disposed on the first dielectric layer and the reflective element. The color filter layer is disposed on the backside of the semiconductor substrate.
Public/Granted literature
- US20210020671A1 IMAGE SENSOR AND METHOD OF FORMING THE SAME Public/Granted day:2021-01-21
Information query
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