Invention Grant
- Patent Title: Methods and apparatus for inspection of a structure and associated apparatuses
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Application No.: US16656094Application Date: 2019-10-17
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Publication No.: US11175592B2Publication Date: 2021-11-16
- Inventor: Elie Badr , Shawn Shakahwat Millat , Giacomo Miceli , Alok Verma
- Applicant: ASML Netherlands B. V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B. V.
- Current Assignee: ASML Netherlands B. V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP18201147 20181018
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A method for determining an overlay metric is disclosed including obtaining angle resolved distribution spectrum data relating to a measurement of a target structure including a symmetrical component. An overlay dependent contour of a feature of the target structure is determined from the angle resolved distribution spectrum data, from which an overlay metric is determined. The method includes exposing an exposed feature onto a masked layer including a mask which defines masked and unmasked areas of the layer, such that a first portion of the exposed feature is exposed on a masked area of the layer and a second portion of the exposed feature is exposed on a non-masked area of the layer, the size of the first portion with respect to the second portion being overlay dependent; and performing an etch step to define an etched feature, the etched feature corresponding to the second portion of the exposed feature.
Information query
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