Invention Grant
- Patent Title: Method for preparing electrowetting display support plate
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Application No.: US16484882Application Date: 2017-11-15
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Publication No.: US11181733B2Publication Date: 2021-11-23
- Inventor: Guofu Zhou , Hao Wu , Yingying Dou , Fahong Li
- Applicant: SOUTH CHINA NORMAL UNIVERSITY , SHENZHEN GUOHUA OPTOELECTRONICS CO., LTD. , ACADEMY OF SHENZHEN GUOHUA OPTOELECTRONICS
- Applicant Address: CN Guangdong; CN Guangdong; CN Guangdong
- Assignee: SOUTH CHINA NORMAL UNIVERSITY,SHENZHEN GUOHUA OPTOELECTRONICS CO., LTD.,ACADEMY OF SHENZHEN GUOHUA OPTOELECTRONICS
- Current Assignee: SOUTH CHINA NORMAL UNIVERSITY,SHENZHEN GUOHUA OPTOELECTRONICS CO., LTD.,ACADEMY OF SHENZHEN GUOHUA OPTOELECTRONICS
- Current Assignee Address: CN Guangdong; CN Guangdong; CN Guangdong
- Agency: Ware, Fressola, Maguire & Barber LLP
- Priority: CN201710084243.1 20170216
- International Application: PCT/CN2017/110986 WO 20171115
- International Announcement: WO2018/149183 WO 20180823
- Main IPC: G02B26/00
- IPC: G02B26/00

Abstract:
A method for preparing an electrowetting display support plate (5), comprising the following steps: preparing a substrate (7) having an electrode layer; preparing a hydrophobic insulating layer (13) and pixel walls (20) on the substrate (7) having an electrode layer, the pixel walls (20) being made of a hydrophilic material; performing plasma etching on the substrate (7) having the pixel walls (20), the power of the plasma etching being 30-1,000 W/m2; and heating the substrate (7) subjected to the plasma etching, so as to recover the hydrophobicity of the hydrophobic insulating layer (13). According to the method, the technical bias that the display support plate (5) being treated by means of the plasma etching would influence the quality of the hydrophobic insulating layer (13) is eliminated.
Public/Granted literature
- US20200004009A1 METHOD FOR PREPARING ELECTROWETTING DISPLAY SUPPORT PLATE Public/Granted day:2020-01-02
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