Invention Grant
- Patent Title: Semiconductor device and method for manufacturing the same
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Application No.: US16363828Application Date: 2019-03-25
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Publication No.: US11189549B2Publication Date: 2021-11-30
- Inventor: Hidekazu Nakamura , Manabu Yanagihara , Tomohiko Nakamura , Yusuke Katagiri , Katsumi Otani , Takeshi Kawabata
- Applicant: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Applicant Address: JP Osaka
- Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee Address: JP Osaka
- Agency: McDermott Will and Emery LLP
- Priority: JPJP2016-188885 20160927
- Main IPC: H01L23/495
- IPC: H01L23/495 ; H01L29/20 ; H01L23/00 ; H01L25/07 ; H01L25/18 ; H01L21/52 ; H01L23/48 ; H01L23/31

Abstract:
A semiconductor device that is a surface mount-type device includes a nitride semiconductor chip including a silicon substrate having a first thermal expansion coefficient and an InxGayAl1-x-yN layer in contact with a surface of the silicon substrate, where 0≤x≤1, 0≤y≤1, 0≤x+y≤1; and a die pad including Cu and having a second thermal expansion coefficient that is greater than the first thermal expansion coefficient. A thickness of the nitride semiconductor chip is at least 0.2 mm, length L of the nitride semiconductor chip is at least 3.12 mm, and thickness tm of the die pad and length L of the nitride semiconductor chip satisfy tm≥2.00×10−3×L2+0.173, tm being a thickness in mm and L being a length in mm.
Public/Granted literature
- US20190221503A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2019-07-18
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