Invention Grant
- Patent Title: Apparatus and method for measuring particulate matter
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Application No.: US16819643Application Date: 2020-03-16
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Publication No.: US11193871B2Publication Date: 2021-12-07
- Inventor: Ho Jun Chang , Yun S Park , Woo Chang Lee
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2019-0089673 20190724
- Main IPC: G01N15/02
- IPC: G01N15/02 ; G01N15/06 ; G01N15/00

Abstract:
Provided is an apparatus for measuring particulate matter, the apparatus including an air inflow device configured to receive air including particulate matter particles, two or more light sources configured to respectively emit light of different wavelengths to the air received, a pattern measuring device configured to measure scattering patterns for each wavelength of light based on detecting light that is forward-scattered by the particulate matter particles and light that is back-scattered by the particulate matter particles, and a processor configured to obtain a size of the particulate matter particles and a concentration of the particulate matter particles based on the scattering patterns for each wavelength of light.
Public/Granted literature
- US20210025802A1 APPARATUS AND METHOD FOR MEASURING PARTICULATE MATTER Public/Granted day:2021-01-28
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