- 专利标题: Thin film transistor and manufacturing method thereof, gate driving circuit, display substrate and display device
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申请号: US16835948申请日: 2020-03-31
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公开(公告)号: US11205726B2公开(公告)日: 2021-12-21
- 发明人: Jufeng Yu , Ling Han , Tao Ma , Chengshao Yang , Lin Chen
- 申请人: HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. , BOE TECHNOLOGY GROUP CO., LTD.
- 申请人地址: CN Anhui; CN Beijing
- 专利权人: HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- 当前专利权人: HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- 当前专利权人地址: CN Anhui; CN Beijing
- 代理机构: Nath, Goldberg & Meyer
- 代理商 Joshua B. Goldberg
- 优先权: CN201922106072.5 20191129
- 主分类号: H01L29/786
- IPC分类号: H01L29/786 ; H01L29/417 ; G09G3/20 ; H01L29/66 ; G11C19/28 ; H01L21/285
摘要:
The present disclosure provides a thin film transistor, including: an active layer, a source and a drain electrically coupled with the active layer, and a plurality of doped layers located between the source and the active layer and between the drain and the active layer, a resistance of one of the plurality of doped layers farthest away from the active layer is smaller than that of any other doped layer. The disclosure further provides a gate driving circuit, a display substrate and a display device. With the present disclosure, current loss of a current passing through the doped layers of the thin film transistor is reduced, on-state current of the thin film transistor is improved and a situation that output signals of the thin film transistor are insufficient is avoided.
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